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Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP

A process chain for a magnetoelectric device based on porous InP will be presented using only chemical, electrochemical, photoelectrochemical, photochemical treatments and the galvanic deposition of metals in high-aspect-ratio structures. All relevant process steps starting with the formation of a s...

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Detalles Bibliográficos
Autores principales: Gerngross, Mark-Daniel, Carstensen, Jürgen, Föll, Helmut
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3629719/
https://www.ncbi.nlm.nih.gov/pubmed/22776718
http://dx.doi.org/10.1186/1556-276X-7-379
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author Gerngross, Mark-Daniel
Carstensen, Jürgen
Föll, Helmut
author_facet Gerngross, Mark-Daniel
Carstensen, Jürgen
Föll, Helmut
author_sort Gerngross, Mark-Daniel
collection PubMed
description A process chain for a magnetoelectric device based on porous InP will be presented using only chemical, electrochemical, photoelectrochemical, photochemical treatments and the galvanic deposition of metals in high-aspect-ratio structures. All relevant process steps starting with the formation of a self-ordered array of current-line oriented pores followed by the membrane fabrication and a post-etching step, as well as the galvanic metal filling of membrane structures are presented and discussed. The resistivity of a porous InP structure could be drastically increased and, thus, the piezoelectric performance of the porous InP structure. The developed galvanic Ni filling process is capable to homogeneously fill high aspect-ratio membranes.
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spelling pubmed-36297192013-04-22 Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP Gerngross, Mark-Daniel Carstensen, Jürgen Föll, Helmut Nanoscale Res Lett Nano Express A process chain for a magnetoelectric device based on porous InP will be presented using only chemical, electrochemical, photoelectrochemical, photochemical treatments and the galvanic deposition of metals in high-aspect-ratio structures. All relevant process steps starting with the formation of a self-ordered array of current-line oriented pores followed by the membrane fabrication and a post-etching step, as well as the galvanic metal filling of membrane structures are presented and discussed. The resistivity of a porous InP structure could be drastically increased and, thus, the piezoelectric performance of the porous InP structure. The developed galvanic Ni filling process is capable to homogeneously fill high aspect-ratio membranes. Springer 2012-07-09 /pmc/articles/PMC3629719/ /pubmed/22776718 http://dx.doi.org/10.1186/1556-276X-7-379 Text en Copyright ©2012 Gerngross et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Gerngross, Mark-Daniel
Carstensen, Jürgen
Föll, Helmut
Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title_full Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title_fullStr Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title_full_unstemmed Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title_short Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
title_sort electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on inp
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3629719/
https://www.ncbi.nlm.nih.gov/pubmed/22776718
http://dx.doi.org/10.1186/1556-276X-7-379
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