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On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD

Silicon nanocrystals embedded in a silicon-rich silicon oxide matrix doped with Er(3+) ions have been fabricated by electron cyclotron resonance plasma-enhanced chemical vapor deposition. Indirect excitation of erbium photoluminescence via silicon nanocrystals has been investigated. Temperature quen...

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Detalles Bibliográficos
Autores principales: Podhorodecki, Artur, Zatryb, Grzegorz, Golacki, Lukasz W, Misiewicz, Jan, Wojcik, Jacek, Mascher, Peter
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3665460/
https://www.ncbi.nlm.nih.gov/pubmed/23433189
http://dx.doi.org/10.1186/1556-276X-8-98
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author Podhorodecki, Artur
Zatryb, Grzegorz
Golacki, Lukasz W
Misiewicz, Jan
Wojcik, Jacek
Mascher, Peter
author_facet Podhorodecki, Artur
Zatryb, Grzegorz
Golacki, Lukasz W
Misiewicz, Jan
Wojcik, Jacek
Mascher, Peter
author_sort Podhorodecki, Artur
collection PubMed
description Silicon nanocrystals embedded in a silicon-rich silicon oxide matrix doped with Er(3+) ions have been fabricated by electron cyclotron resonance plasma-enhanced chemical vapor deposition. Indirect excitation of erbium photoluminescence via silicon nanocrystals has been investigated. Temperature quenching of the photoluminescence originating from the silicon nanocrystals and the erbium ions has been observed. Activation energies of the thermally activated quenching process were estimated for different excitation wavelengths. The temperature quenching mechanism of the emission is discussed. Also, the origin of visible emission and kinetic properties of Er-related emission have been discussed in details.
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spelling pubmed-36654602013-06-03 On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD Podhorodecki, Artur Zatryb, Grzegorz Golacki, Lukasz W Misiewicz, Jan Wojcik, Jacek Mascher, Peter Nanoscale Res Lett Nano Express Silicon nanocrystals embedded in a silicon-rich silicon oxide matrix doped with Er(3+) ions have been fabricated by electron cyclotron resonance plasma-enhanced chemical vapor deposition. Indirect excitation of erbium photoluminescence via silicon nanocrystals has been investigated. Temperature quenching of the photoluminescence originating from the silicon nanocrystals and the erbium ions has been observed. Activation energies of the thermally activated quenching process were estimated for different excitation wavelengths. The temperature quenching mechanism of the emission is discussed. Also, the origin of visible emission and kinetic properties of Er-related emission have been discussed in details. Springer 2013-02-22 /pmc/articles/PMC3665460/ /pubmed/23433189 http://dx.doi.org/10.1186/1556-276X-8-98 Text en Copyright ©2013 Podhorodecki et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Podhorodecki, Artur
Zatryb, Grzegorz
Golacki, Lukasz W
Misiewicz, Jan
Wojcik, Jacek
Mascher, Peter
On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title_full On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title_fullStr On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title_full_unstemmed On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title_short On the origin of emission and thermal quenching of SRSO:Er(3+) films grown by ECR-PECVD
title_sort on the origin of emission and thermal quenching of srso:er(3+) films grown by ecr-pecvd
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3665460/
https://www.ncbi.nlm.nih.gov/pubmed/23433189
http://dx.doi.org/10.1186/1556-276X-8-98
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