Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching

Silicon nanowire (SiNW) arrays were prepared on silicon substrates by metal-assisted chemical etching and peeled from the substrates, and their optical properties were measured. The absorption coefficient of the SiNW arrays was higher than that for the bulk silicon over the entire region. The absorp...

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Detalles Bibliográficos
Autores principales: Kato, Shinya, Kurokawa, Yasuyoshi, Watanabe, Yuya, Yamada, Yasuharu, Yamada, Akira, Ohta, Yoshimi, Niwa, Yusuke, Hirota, Masaki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3669086/
https://www.ncbi.nlm.nih.gov/pubmed/23651912
http://dx.doi.org/10.1186/1556-276X-8-216

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3669086/
https://www.ncbi.nlm.nih.gov/pubmed/23651912
http://dx.doi.org/10.1186/1556-276X-8-216

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