Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography

In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (10(15) cm(−3)) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon r...

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Detalles Bibliográficos
Autores principales: Dehzangi, Arash, Larki, Farhad, Hutagalung, Sabar D., Goodarz Naseri, Mahmood, Majlis, Burhanuddin Y., Navasery, Manizheh, Hamid, Norihan Abdul, Noor, Mimiwaty Mohd
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2013
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3679133/
https://www.ncbi.nlm.nih.gov/pubmed/23776479
http://dx.doi.org/10.1371/journal.pone.0065409

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3679133/
https://www.ncbi.nlm.nih.gov/pubmed/23776479
http://dx.doi.org/10.1371/journal.pone.0065409

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