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Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography
In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (10(15) cm(−3)) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon r...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Public Library of Science
2013
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3679133/ https://www.ncbi.nlm.nih.gov/pubmed/23776479 http://dx.doi.org/10.1371/journal.pone.0065409 |