Femtosecond pulsed laser deposition of silicon thin films

Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for opt...

Descripción completa

Detalles Bibliográficos
Autores principales: Murray, Matthew, Jose, Gin, Richards, Billy, Jha, Animesh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3693986/
https://www.ncbi.nlm.nih.gov/pubmed/23758871
http://dx.doi.org/10.1186/1556-276X-8-272
_version_ 1782274784984301568
author Murray, Matthew
Jose, Gin
Richards, Billy
Jha, Animesh
author_facet Murray, Matthew
Jose, Gin
Richards, Billy
Jha, Animesh
author_sort Murray, Matthew
collection PubMed
description Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for optical and optoelectronic applications.
format Online
Article
Text
id pubmed-3693986
institution National Center for Biotechnology Information
language English
publishDate 2013
publisher Springer
record_format MEDLINE/PubMed
spelling pubmed-36939862013-06-27 Femtosecond pulsed laser deposition of silicon thin films Murray, Matthew Jose, Gin Richards, Billy Jha, Animesh Nanoscale Res Lett Nano Express Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for optical and optoelectronic applications. Springer 2013-06-07 /pmc/articles/PMC3693986/ /pubmed/23758871 http://dx.doi.org/10.1186/1556-276X-8-272 Text en Copyright ©2013 Murray et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Murray, Matthew
Jose, Gin
Richards, Billy
Jha, Animesh
Femtosecond pulsed laser deposition of silicon thin films
title Femtosecond pulsed laser deposition of silicon thin films
title_full Femtosecond pulsed laser deposition of silicon thin films
title_fullStr Femtosecond pulsed laser deposition of silicon thin films
title_full_unstemmed Femtosecond pulsed laser deposition of silicon thin films
title_short Femtosecond pulsed laser deposition of silicon thin films
title_sort femtosecond pulsed laser deposition of silicon thin films
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3693986/
https://www.ncbi.nlm.nih.gov/pubmed/23758871
http://dx.doi.org/10.1186/1556-276X-8-272
work_keys_str_mv AT murraymatthew femtosecondpulsedlaserdepositionofsiliconthinfilms
AT josegin femtosecondpulsedlaserdepositionofsiliconthinfilms
AT richardsbilly femtosecondpulsedlaserdepositionofsiliconthinfilms
AT jhaanimesh femtosecondpulsedlaserdepositionofsiliconthinfilms

Ejemplares similares