Femtosecond pulsed laser deposition of silicon thin films

Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for opt...

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Detalles Bibliográficos
Autores principales: Murray, Matthew, Jose, Gin, Richards, Billy, Jha, Animesh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3693986/
https://www.ncbi.nlm.nih.gov/pubmed/23758871
http://dx.doi.org/10.1186/1556-276X-8-272

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3693986/
https://www.ncbi.nlm.nih.gov/pubmed/23758871
http://dx.doi.org/10.1186/1556-276X-8-272

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