Fast, exact, and non-destructive diagnoses of contact failures in nano-scale semiconductor device using conductive AFM

We fabricated a novel in-line conductive atomic force microscopy (C-AFM), which can analyze the resistive failures and examine process variance with an exact-positioning capability across the whole wafer scale in in-line DRAM fabrication process. Using this in-line C-AFM, we introduced a new, non-de...

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Detalles Bibliográficos
Autores principales: Shin, ChaeHo, Kim, Kyongjun, Kim, JeongHoi, Ko, Wooseok, Yang, Yusin, Lee, SangKil, Jun, Chung Sam, Kim, Youn Sang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2013
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3695571/
https://www.ncbi.nlm.nih.gov/pubmed/23807513
http://dx.doi.org/10.1038/srep02088

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3695571/
https://www.ncbi.nlm.nih.gov/pubmed/23807513
http://dx.doi.org/10.1038/srep02088

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