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Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures

The Au/DyMnO(3)/Nb:SrTiO(3)/Au stack was demonstrated to be not only a high performance memristor but also a good memcapacitor. The switching time is below 10 ns, the retention is longer than 10(5) s, and the change ratio of resistance (or capacitance) is larger than 100 over the 10(8) switching cyc...

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Detalles Bibliográficos
Autores principales: Yan, Z. B., Liu, J. -M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2013
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3748856/
https://www.ncbi.nlm.nih.gov/pubmed/23963467
http://dx.doi.org/10.1038/srep02482
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author Yan, Z. B.
Liu, J. -M.
author_facet Yan, Z. B.
Liu, J. -M.
author_sort Yan, Z. B.
collection PubMed
description The Au/DyMnO(3)/Nb:SrTiO(3)/Au stack was demonstrated to be not only a high performance memristor but also a good memcapacitor. The switching time is below 10 ns, the retention is longer than 10(5) s, and the change ratio of resistance (or capacitance) is larger than 100 over the 10(8) switching cycles. Moreover, this stack has a broad range of intermediate states that are tunable by the operating voltages. It is indicated that the memory effects originate from the Nb:SrTiO(3)/Au junction where the barrier profile is electrically modulated. The serial connected Au/DyMnO(3)/Nb:SrTiO(3) stack behaves as a high nonlinear resistor paralleling with a capacitor, which raises the capacitance change ratio and enhances the memory stability of the device.
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spelling pubmed-37488562013-08-21 Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures Yan, Z. B. Liu, J. -M. Sci Rep Article The Au/DyMnO(3)/Nb:SrTiO(3)/Au stack was demonstrated to be not only a high performance memristor but also a good memcapacitor. The switching time is below 10 ns, the retention is longer than 10(5) s, and the change ratio of resistance (or capacitance) is larger than 100 over the 10(8) switching cycles. Moreover, this stack has a broad range of intermediate states that are tunable by the operating voltages. It is indicated that the memory effects originate from the Nb:SrTiO(3)/Au junction where the barrier profile is electrically modulated. The serial connected Au/DyMnO(3)/Nb:SrTiO(3) stack behaves as a high nonlinear resistor paralleling with a capacitor, which raises the capacitance change ratio and enhances the memory stability of the device. Nature Publishing Group 2013-08-21 /pmc/articles/PMC3748856/ /pubmed/23963467 http://dx.doi.org/10.1038/srep02482 Text en Copyright © 2013, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/
spellingShingle Article
Yan, Z. B.
Liu, J. -M.
Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title_full Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title_fullStr Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title_full_unstemmed Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title_short Coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
title_sort coexistence of high performance resistance and capacitance memory based on multilayered metal-oxide structures
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3748856/
https://www.ncbi.nlm.nih.gov/pubmed/23963467
http://dx.doi.org/10.1038/srep02482
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