Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography

This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si(0.4)Ge(0.6)/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift...

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Detalles Bibliográficos
Autores principales: Chang, Hung-Tai, Wu, Bo-Lun, Cheng, Shao-Liang, Lee, Tu, Lee, Sheng-Wei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3765112/
https://www.ncbi.nlm.nih.gov/pubmed/23924368
http://dx.doi.org/10.1186/1556-276X-8-349

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3765112/
https://www.ncbi.nlm.nih.gov/pubmed/23924368
http://dx.doi.org/10.1186/1556-276X-8-349

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