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Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement

This paper describes the atomic layer deposition of In(2)(S,O)(3) films by using In(acac)(3) (acac = acetylacetonate), H(2)S and either H(2)O or O(2) plasma as oxygen sources. First, the growth of pure In(2)S(3) films was studied in order to better understand the influence of the oxygen pulses. X-Ra...

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Detalles Bibliográficos
Autores principales:	Bugot, Cathy, Schneider, Nathanaëlle, Lincot, Daniel, Donsanti, Frédérique
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Beilstein-Institut 2013
Materias:	Full Research Paper
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3869344/ https://www.ncbi.nlm.nih.gov/pubmed/24367743 http://dx.doi.org/10.3762/bjnano.4.85

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