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Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

The basic idea of using hexagonally ordered arrays of Au nanoparticles (NP) on top of a given substrate as a mask for the subsequent anisotropic etching in order to fabricate correspondingly ordered arrays of nanopillars meets two serious obstacles: The position of the NP may change during the etchi...

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Detalles Bibliográficos
Autores principales:	Özdemir, Burcin, Seidenstücker, Axel, Plettl, Alfred, Ziemann, Paul
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Beilstein-Institut 2013
Materias:	Full Research Paper
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3869346/ https://www.ncbi.nlm.nih.gov/pubmed/24367758 http://dx.doi.org/10.3762/bjnano.4.100

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