A facile process for soak-and-peel delamination of CVD graphene from substrates using water

We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional dop...

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Autores principales: Gupta, Priti, Dongare, Pratiksha D., Grover, Sameer, Dubey, Sudipta, Mamgain, Hitesh, Bhattacharya, Arnab, Deshmukh, Mandar M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3900997/
https://www.ncbi.nlm.nih.gov/pubmed/24457558
http://dx.doi.org/10.1038/srep03882
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author Gupta, Priti
Dongare, Pratiksha D.
Grover, Sameer
Dubey, Sudipta
Mamgain, Hitesh
Bhattacharya, Arnab
Deshmukh, Mandar M.
author_facet Gupta, Priti
Dongare, Pratiksha D.
Grover, Sameer
Dubey, Sudipta
Mamgain, Hitesh
Bhattacharya, Arnab
Deshmukh, Mandar M.
author_sort Gupta, Priti
collection PubMed
description We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production.
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spelling pubmed-39009972014-01-24 A facile process for soak-and-peel delamination of CVD graphene from substrates using water Gupta, Priti Dongare, Pratiksha D. Grover, Sameer Dubey, Sudipta Mamgain, Hitesh Bhattacharya, Arnab Deshmukh, Mandar M. Sci Rep Article We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production. Nature Publishing Group 2014-01-24 /pmc/articles/PMC3900997/ /pubmed/24457558 http://dx.doi.org/10.1038/srep03882 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/
spellingShingle Article
Gupta, Priti
Dongare, Pratiksha D.
Grover, Sameer
Dubey, Sudipta
Mamgain, Hitesh
Bhattacharya, Arnab
Deshmukh, Mandar M.
A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title_full A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title_fullStr A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title_full_unstemmed A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title_short A facile process for soak-and-peel delamination of CVD graphene from substrates using water
title_sort facile process for soak-and-peel delamination of cvd graphene from substrates using water
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3900997/
https://www.ncbi.nlm.nih.gov/pubmed/24457558
http://dx.doi.org/10.1038/srep03882
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