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Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry
An optical surface roughness model is presented, which allows a reliable determination of the dielectric function of thin films with high surface roughnesses of more than 10 nm peak to valley distance by means of spectroscopic ellipsometry. Starting from histogram evaluation of atomic force microsco...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer International Publishing
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3929596/ https://www.ncbi.nlm.nih.gov/pubmed/24570853 http://dx.doi.org/10.1186/2193-1801-3-82 |