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Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process
Ex situ spectroscopic ellipsometry (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100> surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
2013
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3947492/ https://www.ncbi.nlm.nih.gov/pubmed/24619506 http://dx.doi.org/10.1186/2228-5326-3-10 |
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author | Kurhekar, Anil Sudhakar Apte, Prakash R |
author_facet | Kurhekar, Anil Sudhakar Apte, Prakash R |
author_sort | Kurhekar, Anil Sudhakar |
collection | PubMed |
description | Ex situ spectroscopic ellipsometry (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100> surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent dielectric layer, and SE measurements are performed. The SE analyses indicate that after a 20-s 100:5 HF dip with rinse, the Si (100) surface was passivated by the hydrogen termination and remained chemically stable. Roughness of the HF-etched bare Si (100) surface was observed and analyzed by the ex-situ SE. Evidence for desorption of the H-terminated Si surface layer is studied using Fourier transform infrared spectroscopy and ellipsometry, and discussed. This piece of work explains the usage of an ex situ, non-destructive technique capable of showing state of passivation, the H-termination of Si<100> surfaces. |
format | Online Article Text |
id | pubmed-3947492 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2013 |
record_format | MEDLINE/PubMed |
spelling | pubmed-39474922014-03-09 Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process Kurhekar, Anil Sudhakar Apte, Prakash R Int Nano Lett Article Ex situ spectroscopic ellipsometry (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100> surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent dielectric layer, and SE measurements are performed. The SE analyses indicate that after a 20-s 100:5 HF dip with rinse, the Si (100) surface was passivated by the hydrogen termination and remained chemically stable. Roughness of the HF-etched bare Si (100) surface was observed and analyzed by the ex-situ SE. Evidence for desorption of the H-terminated Si surface layer is studied using Fourier transform infrared spectroscopy and ellipsometry, and discussed. This piece of work explains the usage of an ex situ, non-destructive technique capable of showing state of passivation, the H-termination of Si<100> surfaces. 2013-02-22 /pmc/articles/PMC3947492/ /pubmed/24619506 http://dx.doi.org/10.1186/2228-5326-3-10 Text en © 2013 Kurhekar and Apte; licensee Springer. This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Article Kurhekar, Anil Sudhakar Apte, Prakash R Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title | Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title_full | Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title_fullStr | Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title_full_unstemmed | Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title_short | Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process |
title_sort | spectroscopic-ellipsometric study of native oxide removal by liquid phase hf process |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3947492/ https://www.ncbi.nlm.nih.gov/pubmed/24619506 http://dx.doi.org/10.1186/2228-5326-3-10 |
work_keys_str_mv | AT kurhekaranilsudhakar spectroscopicellipsometricstudyofnativeoxideremovalbyliquidphasehfprocess AT apteprakashr spectroscopicellipsometricstudyofnativeoxideremovalbyliquidphasehfprocess |