Cargando…
Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process
Ex situ spectroscopic ellipsometry (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100> surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent...
| Autores principales: | , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
2013
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3947492/ https://www.ncbi.nlm.nih.gov/pubmed/24619506 http://dx.doi.org/10.1186/2228-5326-3-10 |