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Application of three-dimensionally area-selective atomic layer deposition for selectively coating the vertical surfaces of standing nanopillars

We describe a strategy for selectively coating the vertical surfaces of standing nanopillars using area-selective atomic layer deposition (ALD). Hydrophobic self-assembled monolayers (SAMs) are utilised to selectively inhibit the coating of oxides on the modified horizontal regions to ensure that on...

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Detalles Bibliográficos
Autores principales:	Dong, Wenjing, Zhang, Kenan, Zhang, Yun, Wei, Tiaoxing, Sun, Yan, Chen, Xin, Dai, Ning
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2014
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3964512/ https://www.ncbi.nlm.nih.gov/pubmed/24662775 http://dx.doi.org/10.1038/srep04458

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