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Structural and optical properties of ITO/TiO(2) anti-reflective films for solar cell applications

Indium tin oxide (ITO) and titanium dioxide (TiO(2)) anti-reflective coatings (ARCs) were deposited on a (100) P-type monocrystalline Si substrate by a radio-frequency (RF) magnetron sputtering. Polycrystalline ITO and anatase TiO(2) films were obtained at room temperature (RT). The thickness of ITO...

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Detalles Bibliográficos
Autores principales: Ali, Khuram, Khan, Sohail A, Jafri, Mohd Zubir Mat
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3986428/
https://www.ncbi.nlm.nih.gov/pubmed/24721986
http://dx.doi.org/10.1186/1556-276X-9-175
Descripción
Sumario:Indium tin oxide (ITO) and titanium dioxide (TiO(2)) anti-reflective coatings (ARCs) were deposited on a (100) P-type monocrystalline Si substrate by a radio-frequency (RF) magnetron sputtering. Polycrystalline ITO and anatase TiO(2) films were obtained at room temperature (RT). The thickness of ITO (60 to 64 nm) and TiO(2) (55 to 60 nm) films was optimized, considering the optical response in the 400- to 1,000-nm wavelength range. The deposited films were characterized by X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM). The XRD analysis showed preferential orientation along (211) and (222) for ITO and (200) and (211) for TiO(2) films. The XRD analysis showed that crystalline ITO/TiO(2) films could be formed at RT. The crystallite strain measurements showed compressive strain for ITO and TiO(2) films. The measured average optical reflectance was about 12% and 10% for the ITO and TiO(2) ARCs, respectively.