Similarity Ratio Analysis for Early Stage Fault Detection with Optical Emission Spectrometer in Plasma Etching Process

A Similarity Ratio Analysis (SRA) method is proposed for early-stage Fault Detection (FD) in plasma etching processes using real-time Optical Emission Spectrometer (OES) data as input. The SRA method can help to realise a highly precise control system by detecting abnormal etch-rate faults in real-t...

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Detalles Bibliográficos
Autores principales: Yang, Jie, McArdle, Conor, Daniels, Stephen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2014
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3995992/
https://www.ncbi.nlm.nih.gov/pubmed/24755865
http://dx.doi.org/10.1371/journal.pone.0095679

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3995992/
https://www.ncbi.nlm.nih.gov/pubmed/24755865
http://dx.doi.org/10.1371/journal.pone.0095679

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