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Electron beam lithography with feedback using in situ self-developed resist
Due to the lack of feedback, conventional electron beam lithography (EBL) is a ‘blind’ open-loop process where the exposed pattern is examined only after ex situ resist development, which is too late for any improvement. Here, we report that self-developing nitrocellulose resist, for which the patte...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3998223/ https://www.ncbi.nlm.nih.gov/pubmed/24739818 http://dx.doi.org/10.1186/1556-276X-9-184 |