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Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes

Modulation of the junction resistance between metallic nanowires is a crucial factor for high performance of the network-structured conducting film. Here, we show that under current flow, silver nanowire (AgNW) network films can be stabilised by minimizing the Joule heating at the NW-NW junction ass...

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Autores principales: Woo, Jong Seok, Han, Joong Tark, Jung, Sunshin, Jang, Jeong In, Kim, Ho Young, Jeong, Hee Jin, Jeong, Seung Yol, Baeg, Kang-Jun, Lee, Geon-Woong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999447/
https://www.ncbi.nlm.nih.gov/pubmed/24763208
http://dx.doi.org/10.1038/srep04804
_version_ 1782313495222550528
author Woo, Jong Seok
Han, Joong Tark
Jung, Sunshin
Jang, Jeong In
Kim, Ho Young
Jeong, Hee Jin
Jeong, Seung Yol
Baeg, Kang-Jun
Lee, Geon-Woong
author_facet Woo, Jong Seok
Han, Joong Tark
Jung, Sunshin
Jang, Jeong In
Kim, Ho Young
Jeong, Hee Jin
Jeong, Seung Yol
Baeg, Kang-Jun
Lee, Geon-Woong
author_sort Woo, Jong Seok
collection PubMed
description Modulation of the junction resistance between metallic nanowires is a crucial factor for high performance of the network-structured conducting film. Here, we show that under current flow, silver nanowire (AgNW) network films can be stabilised by minimizing the Joule heating at the NW-NW junction assisted by in-situ interconnection with a small amount (less than 3 wt%) of single-walled carbon nanotubes (SWCNTs). This was achieved by direct deposition of AgNW suspension containing SWCNTs functionalised with quadruple hydrogen bonding moieties excluding dispersant molecules. The electrical stabilisation mechanism of AgNW networks involves the modulation of the electrical transportation pathway by the SWCNTs through the SWCNT-AgNW junctions, which results in a relatively lower junction resistance than the NW-NW junction in the network film. In addition, we propose that good contact and Fermi level matching between AgNWs and modified SWCNTs lead to the modulation of the current pathway. The SWCNT-induced stabilisation of the AgNW networks was also demonstrated by irradiating the film with microwaves. The development of the high-throughput fabrication technology provides a robust and scalable strategy for realizing high-performance flexible transparent conductor films.
format Online
Article
Text
id pubmed-3999447
institution National Center for Biotechnology Information
language English
publishDate 2014
publisher Nature Publishing Group
record_format MEDLINE/PubMed
spelling pubmed-39994472014-04-25 Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes Woo, Jong Seok Han, Joong Tark Jung, Sunshin Jang, Jeong In Kim, Ho Young Jeong, Hee Jin Jeong, Seung Yol Baeg, Kang-Jun Lee, Geon-Woong Sci Rep Article Modulation of the junction resistance between metallic nanowires is a crucial factor for high performance of the network-structured conducting film. Here, we show that under current flow, silver nanowire (AgNW) network films can be stabilised by minimizing the Joule heating at the NW-NW junction assisted by in-situ interconnection with a small amount (less than 3 wt%) of single-walled carbon nanotubes (SWCNTs). This was achieved by direct deposition of AgNW suspension containing SWCNTs functionalised with quadruple hydrogen bonding moieties excluding dispersant molecules. The electrical stabilisation mechanism of AgNW networks involves the modulation of the electrical transportation pathway by the SWCNTs through the SWCNT-AgNW junctions, which results in a relatively lower junction resistance than the NW-NW junction in the network film. In addition, we propose that good contact and Fermi level matching between AgNWs and modified SWCNTs lead to the modulation of the current pathway. The SWCNT-induced stabilisation of the AgNW networks was also demonstrated by irradiating the film with microwaves. The development of the high-throughput fabrication technology provides a robust and scalable strategy for realizing high-performance flexible transparent conductor films. Nature Publishing Group 2014-04-25 /pmc/articles/PMC3999447/ /pubmed/24763208 http://dx.doi.org/10.1038/srep04804 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License. The images in this article are included in the article's Creative Commons license, unless indicated otherwise in the image credit; if the image is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the image. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/
spellingShingle Article
Woo, Jong Seok
Han, Joong Tark
Jung, Sunshin
Jang, Jeong In
Kim, Ho Young
Jeong, Hee Jin
Jeong, Seung Yol
Baeg, Kang-Jun
Lee, Geon-Woong
Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title_full Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title_fullStr Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title_full_unstemmed Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title_short Electrically Robust Metal Nanowire Network Formation by In-Situ Interconnection with Single-Walled Carbon Nanotubes
title_sort electrically robust metal nanowire network formation by in-situ interconnection with single-walled carbon nanotubes
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999447/
https://www.ncbi.nlm.nih.gov/pubmed/24763208
http://dx.doi.org/10.1038/srep04804
work_keys_str_mv AT woojongseok electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT hanjoongtark electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT jungsunshin electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT jangjeongin electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT kimhoyoung electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT jeongheejin electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT jeongseungyol electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT baegkangjun electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes
AT leegeonwoong electricallyrobustmetalnanowirenetworkformationbyinsituinterconnectionwithsinglewalledcarbonnanotubes