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Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films
Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bon...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4028925/ https://www.ncbi.nlm.nih.gov/pubmed/24846506 http://dx.doi.org/10.1038/srep05021 |
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author | Dwivedi, Neeraj Rismani-Yazdi, Ehsan Yeo, Reuben J. Goohpattader, Partho S. Satyanarayana, Nalam Srinivasan, Narasimhan Druz, Boris Tripathy, S. Bhatia, C. S. |
author_facet | Dwivedi, Neeraj Rismani-Yazdi, Ehsan Yeo, Reuben J. Goohpattader, Partho S. Satyanarayana, Nalam Srinivasan, Narasimhan Druz, Boris Tripathy, S. Bhatia, C. S. |
author_sort | Dwivedi, Neeraj |
collection | PubMed |
description | Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bonding, density, wear resistance etc., compared to their bulk counterpart. We report for the first time how an atomically thin (0.4 nm) silicon nitride (SiN(x)) interlayer helps in maintaining/improving the sp(3) carbon bonding, enhancing interfacial strength/bonding, improving oxidation/corrosion resistance, and strengthening the tribological properties of FCVA-deposited carbon films, even at ultrathin levels (1.2 nm). We propose the role of the SiN(x) interlayer in preventing the catalytic activity of Co and Pt in media, leading to enhanced sp(3)C bonding (relative enhancement ~40%). These findings are extremely important in view of the atomic level understanding of structural modification and the development of high density HDDs. |
format | Online Article Text |
id | pubmed-4028925 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-40289252014-05-21 Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films Dwivedi, Neeraj Rismani-Yazdi, Ehsan Yeo, Reuben J. Goohpattader, Partho S. Satyanarayana, Nalam Srinivasan, Narasimhan Druz, Boris Tripathy, S. Bhatia, C. S. Sci Rep Article Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bonding, density, wear resistance etc., compared to their bulk counterpart. We report for the first time how an atomically thin (0.4 nm) silicon nitride (SiN(x)) interlayer helps in maintaining/improving the sp(3) carbon bonding, enhancing interfacial strength/bonding, improving oxidation/corrosion resistance, and strengthening the tribological properties of FCVA-deposited carbon films, even at ultrathin levels (1.2 nm). We propose the role of the SiN(x) interlayer in preventing the catalytic activity of Co and Pt in media, leading to enhanced sp(3)C bonding (relative enhancement ~40%). These findings are extremely important in view of the atomic level understanding of structural modification and the development of high density HDDs. Nature Publishing Group 2014-05-21 /pmc/articles/PMC4028925/ /pubmed/24846506 http://dx.doi.org/10.1038/srep05021 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-sa/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 3.0 Unported License. The images in this article are included in the article's Creative Commons license, unless indicated otherwise in the image credit; if the image is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the image. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-sa/3.0/ |
spellingShingle | Article Dwivedi, Neeraj Rismani-Yazdi, Ehsan Yeo, Reuben J. Goohpattader, Partho S. Satyanarayana, Nalam Srinivasan, Narasimhan Druz, Boris Tripathy, S. Bhatia, C. S. Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title | Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title_full | Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title_fullStr | Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title_full_unstemmed | Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title_short | Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films |
title_sort | probing the role of an atomically thin sin(x) interlayer on the structure of ultrathin carbon films |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4028925/ https://www.ncbi.nlm.nih.gov/pubmed/24846506 http://dx.doi.org/10.1038/srep05021 |
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