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Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films
Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bon...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4028925/ https://www.ncbi.nlm.nih.gov/pubmed/24846506 http://dx.doi.org/10.1038/srep05021 |