Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films

Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bon...

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Detalles Bibliográficos
Autores principales: Dwivedi, Neeraj, Rismani-Yazdi, Ehsan, Yeo, Reuben J., Goohpattader, Partho S., Satyanarayana, Nalam, Srinivasan, Narasimhan, Druz, Boris, Tripathy, S., Bhatia, C. S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4028925/
https://www.ncbi.nlm.nih.gov/pubmed/24846506
http://dx.doi.org/10.1038/srep05021

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