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Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process
The modeling and fabrication of a magnetic microsensor based on a magneto-transistor were presented. The magnetic sensor is fabricated by the commercial 0.18 μm complementary metal oxide semiconductor (CMOS) process without any post-process. The finite element method (FEM) software Sentaurus TCAD is...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4029674/ https://www.ncbi.nlm.nih.gov/pubmed/24732100 http://dx.doi.org/10.3390/s140406722 |
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author | Tseng, Jian-Zhi Wu, Chyan-Chyi Dai, Ching-Liang |
author_facet | Tseng, Jian-Zhi Wu, Chyan-Chyi Dai, Ching-Liang |
author_sort | Tseng, Jian-Zhi |
collection | PubMed |
description | The modeling and fabrication of a magnetic microsensor based on a magneto-transistor were presented. The magnetic sensor is fabricated by the commercial 0.18 μm complementary metal oxide semiconductor (CMOS) process without any post-process. The finite element method (FEM) software Sentaurus TCAD is utilized to analyze the electrical properties and carriers motion path of the magneto-transistor. A readout circuit is used to amplify the voltage difference of the bases into the output voltage. Experiments show that the sensitivity of the magnetic sensor is 354 mV/T at the supply current of 4 mA. |
format | Online Article Text |
id | pubmed-4029674 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-40296742014-05-22 Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process Tseng, Jian-Zhi Wu, Chyan-Chyi Dai, Ching-Liang Sensors (Basel) Article The modeling and fabrication of a magnetic microsensor based on a magneto-transistor were presented. The magnetic sensor is fabricated by the commercial 0.18 μm complementary metal oxide semiconductor (CMOS) process without any post-process. The finite element method (FEM) software Sentaurus TCAD is utilized to analyze the electrical properties and carriers motion path of the magneto-transistor. A readout circuit is used to amplify the voltage difference of the bases into the output voltage. Experiments show that the sensitivity of the magnetic sensor is 354 mV/T at the supply current of 4 mA. MDPI 2014-04-11 /pmc/articles/PMC4029674/ /pubmed/24732100 http://dx.doi.org/10.3390/s140406722 Text en © 2014 by the authors; licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/). |
spellingShingle | Article Tseng, Jian-Zhi Wu, Chyan-Chyi Dai, Ching-Liang Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title | Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title_full | Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title_fullStr | Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title_full_unstemmed | Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title_short | Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process |
title_sort | modeling and manufacturing of a micromachined magnetic sensor using the cmos process without any post-process |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4029674/ https://www.ncbi.nlm.nih.gov/pubmed/24732100 http://dx.doi.org/10.3390/s140406722 |
work_keys_str_mv | AT tsengjianzhi modelingandmanufacturingofamicromachinedmagneticsensorusingthecmosprocesswithoutanypostprocess AT wuchyanchyi modelingandmanufacturingofamicromachinedmagneticsensorusingthecmosprocesswithoutanypostprocess AT daichingliang modelingandmanufacturingofamicromachinedmagneticsensorusingthecmosprocesswithoutanypostprocess |