A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene

Based on the extensive application of 2 × 1.7MV Tandetron accelerator, a low-energy cluster chamber has been built to explore for synthesizing graphene. Raman spectrum and atomic force microscopy (AFM) show that an amorphous carbon film in nanometer was deposited on the silicon by C(4) cluster impla...

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Detalles Bibliográficos
Autores principales: Wang, Zesong, Zhang, Zaodi, Zhang, Rui, Li, Hui, Fu, Dejun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4029969/
https://www.ncbi.nlm.nih.gov/pubmed/24910570
http://dx.doi.org/10.1186/1556-276X-9-205
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author Wang, Zesong
Zhang, Zaodi
Zhang, Rui
Li, Hui
Fu, Dejun
author_facet Wang, Zesong
Zhang, Zaodi
Zhang, Rui
Li, Hui
Fu, Dejun
author_sort Wang, Zesong
collection PubMed
description Based on the extensive application of 2 × 1.7MV Tandetron accelerator, a low-energy cluster chamber has been built to explore for synthesizing graphene. Raman spectrum and atomic force microscopy (AFM) show that an amorphous carbon film in nanometer was deposited on the silicon by C(4) cluster implantation. And we replaced the substrate with Ni/SiO(2)/Si and measured the thickness of Ni film by Rutherford backscattering spectrometry (RBS). Combined with suitable anneal conditions, these samples implanted by various small carbon clusters were made to grow graphene. Results from Raman spectrum reveal that few-layer graphene were obtained and discuss whether I(G)/I(2D) can contribute to explain the relationship between the number of graphene layers and cluster implantation dosage.
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spelling pubmed-40299692014-06-06 A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene Wang, Zesong Zhang, Zaodi Zhang, Rui Li, Hui Fu, Dejun Nanoscale Res Lett Nano Express Based on the extensive application of 2 × 1.7MV Tandetron accelerator, a low-energy cluster chamber has been built to explore for synthesizing graphene. Raman spectrum and atomic force microscopy (AFM) show that an amorphous carbon film in nanometer was deposited on the silicon by C(4) cluster implantation. And we replaced the substrate with Ni/SiO(2)/Si and measured the thickness of Ni film by Rutherford backscattering spectrometry (RBS). Combined with suitable anneal conditions, these samples implanted by various small carbon clusters were made to grow graphene. Results from Raman spectrum reveal that few-layer graphene were obtained and discuss whether I(G)/I(2D) can contribute to explain the relationship between the number of graphene layers and cluster implantation dosage. Springer 2014-05-02 /pmc/articles/PMC4029969/ /pubmed/24910570 http://dx.doi.org/10.1186/1556-276X-9-205 Text en Copyright © 2014 Wang et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.
spellingShingle Nano Express
Wang, Zesong
Zhang, Zaodi
Zhang, Rui
Li, Hui
Fu, Dejun
A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title_full A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title_fullStr A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title_full_unstemmed A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title_short A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
title_sort preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4029969/
https://www.ncbi.nlm.nih.gov/pubmed/24910570
http://dx.doi.org/10.1186/1556-276X-9-205
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