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A preparation approach of exploring cluster ion implantation: from ultra-thin carbon film to graphene

Based on the extensive application of 2 × 1.7MV Tandetron accelerator, a low-energy cluster chamber has been built to explore for synthesizing graphene. Raman spectrum and atomic force microscopy (AFM) show that an amorphous carbon film in nanometer was deposited on the silicon by C(4) cluster impla...

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Detalles Bibliográficos
Autores principales: Wang, Zesong, Zhang, Zaodi, Zhang, Rui, Li, Hui, Fu, Dejun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4029969/
https://www.ncbi.nlm.nih.gov/pubmed/24910570
http://dx.doi.org/10.1186/1556-276X-9-205

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