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Fabrication of 200 nm Period Hard X-ray Phase Gratings
[Image: see text] Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 10...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2014
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4055044/ https://www.ncbi.nlm.nih.gov/pubmed/24845537 http://dx.doi.org/10.1021/nl5009713 |
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author | Miao, Houxun Gomella, Andrew A. Chedid, Nicholas Chen, Lei Wen, Han |
author_facet | Miao, Houxun Gomella, Andrew A. Chedid, Nicholas Chen, Lei Wen, Han |
author_sort | Miao, Houxun |
collection | PubMed |
description | [Image: see text] Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments. |
format | Online Article Text |
id | pubmed-4055044 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | American Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-40550442015-05-20 Fabrication of 200 nm Period Hard X-ray Phase Gratings Miao, Houxun Gomella, Andrew A. Chedid, Nicholas Chen, Lei Wen, Han Nano Lett [Image: see text] Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments. American Chemical Society 2014-05-20 2014-06-11 /pmc/articles/PMC4055044/ /pubmed/24845537 http://dx.doi.org/10.1021/nl5009713 Text en Copyright © 2014 U.S. Government |
spellingShingle | Miao, Houxun Gomella, Andrew A. Chedid, Nicholas Chen, Lei Wen, Han Fabrication of 200 nm Period Hard X-ray Phase Gratings |
title | Fabrication of 200 nm Period Hard X-ray Phase
Gratings |
title_full | Fabrication of 200 nm Period Hard X-ray Phase
Gratings |
title_fullStr | Fabrication of 200 nm Period Hard X-ray Phase
Gratings |
title_full_unstemmed | Fabrication of 200 nm Period Hard X-ray Phase
Gratings |
title_short | Fabrication of 200 nm Period Hard X-ray Phase
Gratings |
title_sort | fabrication of 200 nm period hard x-ray phase
gratings |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4055044/ https://www.ncbi.nlm.nih.gov/pubmed/24845537 http://dx.doi.org/10.1021/nl5009713 |
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