Cargando…

A nanometric cushion for enhancing scratch and wear resistance of hard films

Scratch resistance and friction are core properties which define the tribological characteristics of materials. Attempts to optimize these quantities at solid surfaces are the subject of intense technological interest. The capability to modulate these surface properties while preserving both the bul...

Descripción completa

Detalles Bibliográficos
Autores principales: Gotlib-Vainshtein, Katya, Girshevitz, Olga, Sukenik, Chaim N, Barlam, David, Cohen, Sidney R
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4143114/
https://www.ncbi.nlm.nih.gov/pubmed/25161836
http://dx.doi.org/10.3762/bjnano.5.114
_version_ 1782331852883755008
author Gotlib-Vainshtein, Katya
Girshevitz, Olga
Sukenik, Chaim N
Barlam, David
Cohen, Sidney R
author_facet Gotlib-Vainshtein, Katya
Girshevitz, Olga
Sukenik, Chaim N
Barlam, David
Cohen, Sidney R
author_sort Gotlib-Vainshtein, Katya
collection PubMed
description Scratch resistance and friction are core properties which define the tribological characteristics of materials. Attempts to optimize these quantities at solid surfaces are the subject of intense technological interest. The capability to modulate these surface properties while preserving both the bulk properties of the materials and a well-defined, constant chemical composition of the surface is particularly attractive. We report herein the use of a soft, flexible underlayer to control the scratch resistance of oxide surfaces. Titania films of several nm thickness are coated onto substrates of silicon, kapton, polycarbonate, and polydimethylsiloxane (PDMS). The scratch resistance measured by scanning force microscopy is found to be substrate dependent, diminishing in the order PDMS, kapton/polycarbonate, Si/SiO(2). Furthermore, when PDMS is applied as an intermediate layer between a harder substrate and titania, marked improvement in the scratch resistance is achieved. This is shown by quantitative wear tests for silicon or kapton, by coating these substrates with PDMS which is subsequently capped by a titania layer, resulting in enhanced scratch/wear resistance. The physical basis of this effect is explored by means of Finite Element Analysis, and we suggest a model for friction reduction based on the "cushioning effect” of a soft intermediate layer.
format Online
Article
Text
id pubmed-4143114
institution National Center for Biotechnology Information
language English
publishDate 2014
publisher Beilstein-Institut
record_format MEDLINE/PubMed
spelling pubmed-41431142014-08-26 A nanometric cushion for enhancing scratch and wear resistance of hard films Gotlib-Vainshtein, Katya Girshevitz, Olga Sukenik, Chaim N Barlam, David Cohen, Sidney R Beilstein J Nanotechnol Full Research Paper Scratch resistance and friction are core properties which define the tribological characteristics of materials. Attempts to optimize these quantities at solid surfaces are the subject of intense technological interest. The capability to modulate these surface properties while preserving both the bulk properties of the materials and a well-defined, constant chemical composition of the surface is particularly attractive. We report herein the use of a soft, flexible underlayer to control the scratch resistance of oxide surfaces. Titania films of several nm thickness are coated onto substrates of silicon, kapton, polycarbonate, and polydimethylsiloxane (PDMS). The scratch resistance measured by scanning force microscopy is found to be substrate dependent, diminishing in the order PDMS, kapton/polycarbonate, Si/SiO(2). Furthermore, when PDMS is applied as an intermediate layer between a harder substrate and titania, marked improvement in the scratch resistance is achieved. This is shown by quantitative wear tests for silicon or kapton, by coating these substrates with PDMS which is subsequently capped by a titania layer, resulting in enhanced scratch/wear resistance. The physical basis of this effect is explored by means of Finite Element Analysis, and we suggest a model for friction reduction based on the "cushioning effect” of a soft intermediate layer. Beilstein-Institut 2014-07-10 /pmc/articles/PMC4143114/ /pubmed/25161836 http://dx.doi.org/10.3762/bjnano.5.114 Text en Copyright © 2014, Gotlib-Vainshtein et al. https://creativecommons.org/licenses/by/2.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Full Research Paper
Gotlib-Vainshtein, Katya
Girshevitz, Olga
Sukenik, Chaim N
Barlam, David
Cohen, Sidney R
A nanometric cushion for enhancing scratch and wear resistance of hard films
title A nanometric cushion for enhancing scratch and wear resistance of hard films
title_full A nanometric cushion for enhancing scratch and wear resistance of hard films
title_fullStr A nanometric cushion for enhancing scratch and wear resistance of hard films
title_full_unstemmed A nanometric cushion for enhancing scratch and wear resistance of hard films
title_short A nanometric cushion for enhancing scratch and wear resistance of hard films
title_sort nanometric cushion for enhancing scratch and wear resistance of hard films
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4143114/
https://www.ncbi.nlm.nih.gov/pubmed/25161836
http://dx.doi.org/10.3762/bjnano.5.114
work_keys_str_mv AT gotlibvainshteinkatya ananometriccushionforenhancingscratchandwearresistanceofhardfilms
AT girshevitzolga ananometriccushionforenhancingscratchandwearresistanceofhardfilms
AT sukenikchaimn ananometriccushionforenhancingscratchandwearresistanceofhardfilms
AT barlamdavid ananometriccushionforenhancingscratchandwearresistanceofhardfilms
AT cohensidneyr ananometriccushionforenhancingscratchandwearresistanceofhardfilms
AT gotlibvainshteinkatya nanometriccushionforenhancingscratchandwearresistanceofhardfilms
AT girshevitzolga nanometriccushionforenhancingscratchandwearresistanceofhardfilms
AT sukenikchaimn nanometriccushionforenhancingscratchandwearresistanceofhardfilms
AT barlamdavid nanometriccushionforenhancingscratchandwearresistanceofhardfilms
AT cohensidneyr nanometriccushionforenhancingscratchandwearresistanceofhardfilms