Lamellar Diblock Copolymer Thin Films during Solvent Vapor Annealing Studied by GISAXS: Different Behavior of Parallel and Perpendicular Lamellae

[Image: see text] The reorientation of lamellae and the dependence of the lamellar spacing, D(lam), on polymer volume fraction, ϕ(P), D(lam) ∝ ϕ(P)(–β), in diblock copolymer thin films during solvent vapor annealing (SVA) are examined by combining white light interferometry (WLI) and grazing-inciden...

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Detalles Bibliográficos
Autores principales: Zhang, Jianqi, Posselt, Dorthe, Smilgies, Detlef-M., Perlich, Jan, Kyriakos, Konstantinos, Jaksch, Sebastian, Papadakis, Christine M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2014
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4150605/
https://www.ncbi.nlm.nih.gov/pubmed/25197146
http://dx.doi.org/10.1021/ma500633b

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