Combined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributions()

The continuous downscaling of the process size for semiconductor devices pushes the junction depths and consequentially the implantation depths to the top few nanometers of the Si substrate. This motivates the need for sensitive methods capable of analyzing dopant distribution, total dose and possib...

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Detalles Bibliográficos
Autores principales: Ingerle, D., Meirer, F., Pepponi, G., Demenev, E., Giubertoni, D., Wobrauschek, P., Streli, C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4152003/
https://www.ncbi.nlm.nih.gov/pubmed/25202165
http://dx.doi.org/10.1016/j.sab.2014.06.019

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4152003/
https://www.ncbi.nlm.nih.gov/pubmed/25202165
http://dx.doi.org/10.1016/j.sab.2014.06.019

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