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Combined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributions()
The continuous downscaling of the process size for semiconductor devices pushes the junction depths and consequentially the implantation depths to the top few nanometers of the Si substrate. This motivates the need for sensitive methods capable of analyzing dopant distribution, total dose and possib...
Autores principales: | Ingerle, D., Meirer, F., Pepponi, G., Demenev, E., Giubertoni, D., Wobrauschek, P., Streli, C. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Elsevier
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4152003/ https://www.ncbi.nlm.nih.gov/pubmed/25202165 http://dx.doi.org/10.1016/j.sab.2014.06.019 |
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