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Ab initio electronic properties of dual phosphorus monolayers in silicon

In the midst of the epitaxial circuitry revolution in silicon technology, we look ahead to the next paradigm shift: effective use of the third dimension - in particular, its combination with epitaxial technology. We perform ab initio calculations of atomically thin epitaxial bilayers in silicon, inv...

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Detalles Bibliográficos
Autores principales: Drumm, Daniel W, Per, Manolo C, Budi, Akin, Hollenberg, Lloyd CL, Russo, Salvy P
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4158386/
https://www.ncbi.nlm.nih.gov/pubmed/25246862
http://dx.doi.org/10.1186/1556-276X-9-443

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