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Ab initio electronic properties of dual phosphorus monolayers in silicon
In the midst of the epitaxial circuitry revolution in silicon technology, we look ahead to the next paradigm shift: effective use of the third dimension - in particular, its combination with epitaxial technology. We perform ab initio calculations of atomically thin epitaxial bilayers in silicon, inv...
Autores principales: | Drumm, Daniel W, Per, Manolo C, Budi, Akin, Hollenberg, Lloyd CL, Russo, Salvy P |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4158386/ https://www.ncbi.nlm.nih.gov/pubmed/25246862 http://dx.doi.org/10.1186/1556-276X-9-443 |
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