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Temperature dependence of sensitized Er(3+) luminescence in silicon-rich oxynitride films

The temperature dependence of sensitized Er(3+) emission via localized states and silicon nanoclusters has been studied to get an insight into the excitation and de-excitation processes in silicon-rich oxynitride films. The thermal quenching of Er(3+) luminescence is elucidated by terms of decay tim...

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Detalles Bibliográficos
Autores principales: Xu, Lingbo, Li, Si, Jin, Lu, Li, Dongsheng, Yang, Deren
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4167255/
https://www.ncbi.nlm.nih.gov/pubmed/25258608
http://dx.doi.org/10.1186/1556-276X-9-489
Descripción
Sumario:The temperature dependence of sensitized Er(3+) emission via localized states and silicon nanoclusters has been studied to get an insight into the excitation and de-excitation processes in silicon-rich oxynitride films. The thermal quenching of Er(3+) luminescence is elucidated by terms of decay time and effective excitation cross section. The temperature quenching of Er(3+) decay time demonstrates the presence of non-radiative trap states, whose density and energy gap between Er(3+)(4)I(13/2) excited levels are reduced by high-temperature annealing. The effective excitation cross section initially increases and eventually decreases with temperature, indicating that the energy transfer process is phonon assisted in both samples.