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Controllable Schottky Barriers between MoS(2) and Permalloy

MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact me...

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Autores principales: Wang, Weiyi, Liu, Yanwen, Tang, Lei, Jin, Yibo, Zhao, Tongtong, Xiu, Faxian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4220285/
https://www.ncbi.nlm.nih.gov/pubmed/25370911
http://dx.doi.org/10.1038/srep06928
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author Wang, Weiyi
Liu, Yanwen
Tang, Lei
Jin, Yibo
Zhao, Tongtong
Xiu, Faxian
author_facet Wang, Weiyi
Liu, Yanwen
Tang, Lei
Jin, Yibo
Zhao, Tongtong
Xiu, Faxian
author_sort Wang, Weiyi
collection PubMed
description MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact metal, hindering the further study of spin transport and spin injection in MoS(2). Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS(2). Ohmic contact is developed between multilayer MoS(2) and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm(2)V(−1)s(−1) at low temperature. Further, by applying back gate voltage and inserting different thickness of Al(2)O(3) layer between the metal and monolayer MoS(2), we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS(2) transistor devices; and it may pave the way to realize spin transport and spin injection in MoS(2).
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spelling pubmed-42202852014-11-06 Controllable Schottky Barriers between MoS(2) and Permalloy Wang, Weiyi Liu, Yanwen Tang, Lei Jin, Yibo Zhao, Tongtong Xiu, Faxian Sci Rep Article MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact metal, hindering the further study of spin transport and spin injection in MoS(2). Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS(2). Ohmic contact is developed between multilayer MoS(2) and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm(2)V(−1)s(−1) at low temperature. Further, by applying back gate voltage and inserting different thickness of Al(2)O(3) layer between the metal and monolayer MoS(2), we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS(2) transistor devices; and it may pave the way to realize spin transport and spin injection in MoS(2). Nature Publishing Group 2014-11-05 /pmc/articles/PMC4220285/ /pubmed/25370911 http://dx.doi.org/10.1038/srep06928 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/
spellingShingle Article
Wang, Weiyi
Liu, Yanwen
Tang, Lei
Jin, Yibo
Zhao, Tongtong
Xiu, Faxian
Controllable Schottky Barriers between MoS(2) and Permalloy
title Controllable Schottky Barriers between MoS(2) and Permalloy
title_full Controllable Schottky Barriers between MoS(2) and Permalloy
title_fullStr Controllable Schottky Barriers between MoS(2) and Permalloy
title_full_unstemmed Controllable Schottky Barriers between MoS(2) and Permalloy
title_short Controllable Schottky Barriers between MoS(2) and Permalloy
title_sort controllable schottky barriers between mos(2) and permalloy
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4220285/
https://www.ncbi.nlm.nih.gov/pubmed/25370911
http://dx.doi.org/10.1038/srep06928
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