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Controllable Schottky Barriers between MoS(2) and Permalloy
MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact me...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4220285/ https://www.ncbi.nlm.nih.gov/pubmed/25370911 http://dx.doi.org/10.1038/srep06928 |
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author | Wang, Weiyi Liu, Yanwen Tang, Lei Jin, Yibo Zhao, Tongtong Xiu, Faxian |
author_facet | Wang, Weiyi Liu, Yanwen Tang, Lei Jin, Yibo Zhao, Tongtong Xiu, Faxian |
author_sort | Wang, Weiyi |
collection | PubMed |
description | MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact metal, hindering the further study of spin transport and spin injection in MoS(2). Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS(2). Ohmic contact is developed between multilayer MoS(2) and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm(2)V(−1)s(−1) at low temperature. Further, by applying back gate voltage and inserting different thickness of Al(2)O(3) layer between the metal and monolayer MoS(2), we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS(2) transistor devices; and it may pave the way to realize spin transport and spin injection in MoS(2). |
format | Online Article Text |
id | pubmed-4220285 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-42202852014-11-06 Controllable Schottky Barriers between MoS(2) and Permalloy Wang, Weiyi Liu, Yanwen Tang, Lei Jin, Yibo Zhao, Tongtong Xiu, Faxian Sci Rep Article MoS(2) is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS(2) and contact metal, hindering the further study of spin transport and spin injection in MoS(2). Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS(2). Ohmic contact is developed between multilayer MoS(2) and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm(2)V(−1)s(−1) at low temperature. Further, by applying back gate voltage and inserting different thickness of Al(2)O(3) layer between the metal and monolayer MoS(2), we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS(2) transistor devices; and it may pave the way to realize spin transport and spin injection in MoS(2). Nature Publishing Group 2014-11-05 /pmc/articles/PMC4220285/ /pubmed/25370911 http://dx.doi.org/10.1038/srep06928 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/ |
spellingShingle | Article Wang, Weiyi Liu, Yanwen Tang, Lei Jin, Yibo Zhao, Tongtong Xiu, Faxian Controllable Schottky Barriers between MoS(2) and Permalloy |
title | Controllable Schottky Barriers between MoS(2) and Permalloy |
title_full | Controllable Schottky Barriers between MoS(2) and Permalloy |
title_fullStr | Controllable Schottky Barriers between MoS(2) and Permalloy |
title_full_unstemmed | Controllable Schottky Barriers between MoS(2) and Permalloy |
title_short | Controllable Schottky Barriers between MoS(2) and Permalloy |
title_sort | controllable schottky barriers between mos(2) and permalloy |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4220285/ https://www.ncbi.nlm.nih.gov/pubmed/25370911 http://dx.doi.org/10.1038/srep06928 |
work_keys_str_mv | AT wangweiyi controllableschottkybarriersbetweenmos2andpermalloy AT liuyanwen controllableschottkybarriersbetweenmos2andpermalloy AT tanglei controllableschottkybarriersbetweenmos2andpermalloy AT jinyibo controllableschottkybarriersbetweenmos2andpermalloy AT zhaotongtong controllableschottkybarriersbetweenmos2andpermalloy AT xiufaxian controllableschottkybarriersbetweenmos2andpermalloy |