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Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS

[Image: see text] Deep-ultraviolet surface-enhanced Raman scattering (UV-SERS) is a promising technique for bioimaging and detection because many biological molecules possess UV absorption lines leading to strongly resonant Raman scattering. Here, Al nanovoid substrates are developed by combining na...

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Autores principales: Ding, Tao, Sigle, Daniel O., Herrmann, Lars O., Wolverson, Daniel, Baumberg, Jeremy J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2014
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4230348/
https://www.ncbi.nlm.nih.gov/pubmed/25291629
http://dx.doi.org/10.1021/am505511v
_version_ 1782344253769252864
author Ding, Tao
Sigle, Daniel O.
Herrmann, Lars O.
Wolverson, Daniel
Baumberg, Jeremy J.
author_facet Ding, Tao
Sigle, Daniel O.
Herrmann, Lars O.
Wolverson, Daniel
Baumberg, Jeremy J.
author_sort Ding, Tao
collection PubMed
description [Image: see text] Deep-ultraviolet surface-enhanced Raman scattering (UV-SERS) is a promising technique for bioimaging and detection because many biological molecules possess UV absorption lines leading to strongly resonant Raman scattering. Here, Al nanovoid substrates are developed by combining nanoimprint lithography of etched polymer/silica opal films with electron beam evaporation, to give a high-performance sensing platform for UV-SERS. Enhancement by more than 3 orders of magnitude in the UV-SERS performance was obtained from the DNA base adenine, matching well the UV plasmonic optical signatures and simulations, demonstrating its suitability for biodetection.
format Online
Article
Text
id pubmed-4230348
institution National Center for Biotechnology Information
language English
publishDate 2014
publisher American Chemical Society
record_format MEDLINE/PubMed
spelling pubmed-42303482014-11-13 Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS Ding, Tao Sigle, Daniel O. Herrmann, Lars O. Wolverson, Daniel Baumberg, Jeremy J. ACS Appl Mater Interfaces [Image: see text] Deep-ultraviolet surface-enhanced Raman scattering (UV-SERS) is a promising technique for bioimaging and detection because many biological molecules possess UV absorption lines leading to strongly resonant Raman scattering. Here, Al nanovoid substrates are developed by combining nanoimprint lithography of etched polymer/silica opal films with electron beam evaporation, to give a high-performance sensing platform for UV-SERS. Enhancement by more than 3 orders of magnitude in the UV-SERS performance was obtained from the DNA base adenine, matching well the UV plasmonic optical signatures and simulations, demonstrating its suitability for biodetection. American Chemical Society 2014-10-07 2014-10-22 /pmc/articles/PMC4230348/ /pubmed/25291629 http://dx.doi.org/10.1021/am505511v Text en Copyright © 2014 American Chemical Society This is an open access article published under a Creative Commons Attribution (CC-BY) License (http://pubs.acs.org/page/policy/authorchoice_ccby_termsofuse.html) , which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.
spellingShingle Ding, Tao
Sigle, Daniel O.
Herrmann, Lars O.
Wolverson, Daniel
Baumberg, Jeremy J.
Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title_full Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title_fullStr Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title_full_unstemmed Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title_short Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
title_sort nanoimprint lithography of al nanovoids for deep-uv sers
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4230348/
https://www.ncbi.nlm.nih.gov/pubmed/25291629
http://dx.doi.org/10.1021/am505511v
work_keys_str_mv AT dingtao nanoimprintlithographyofalnanovoidsfordeepuvsers
AT sigledanielo nanoimprintlithographyofalnanovoidsfordeepuvsers
AT herrmannlarso nanoimprintlithographyofalnanovoidsfordeepuvsers
AT wolversondaniel nanoimprintlithographyofalnanovoidsfordeepuvsers
AT baumbergjeremyj nanoimprintlithographyofalnanovoidsfordeepuvsers