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Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process

This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characte...

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Autores principales: Jo, Yongcheol, Jung, Kyooho, Kim, Jongmin, Woo, Hyeonseok, Han, Jaeseok, Kim, Hyungsang, Hong, Jinpyo, Lee, Jeon-Kook, Im, Hyunsik
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4258682/
https://www.ncbi.nlm.nih.gov/pubmed/25483325
http://dx.doi.org/10.1038/srep07354
_version_ 1782347908508549120
author Jo, Yongcheol
Jung, Kyooho
Kim, Jongmin
Woo, Hyeonseok
Han, Jaeseok
Kim, Hyungsang
Hong, Jinpyo
Lee, Jeon-Kook
Im, Hyunsik
author_facet Jo, Yongcheol
Jung, Kyooho
Kim, Jongmin
Woo, Hyeonseok
Han, Jaeseok
Kim, Hyungsang
Hong, Jinpyo
Lee, Jeon-Kook
Im, Hyunsik
author_sort Jo, Yongcheol
collection PubMed
description This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characteristics are observed within the RS voltage window of −2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiO(x) where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels.
format Online
Article
Text
id pubmed-4258682
institution National Center for Biotechnology Information
language English
publishDate 2014
publisher Nature Publishing Group
record_format MEDLINE/PubMed
spelling pubmed-42586822014-12-15 Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process Jo, Yongcheol Jung, Kyooho Kim, Jongmin Woo, Hyeonseok Han, Jaeseok Kim, Hyungsang Hong, Jinpyo Lee, Jeon-Kook Im, Hyunsik Sci Rep Article This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characteristics are observed within the RS voltage window of −2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiO(x) where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels. Nature Publishing Group 2014-12-08 /pmc/articles/PMC4258682/ /pubmed/25483325 http://dx.doi.org/10.1038/srep07354 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/
spellingShingle Article
Jo, Yongcheol
Jung, Kyooho
Kim, Jongmin
Woo, Hyeonseok
Han, Jaeseok
Kim, Hyungsang
Hong, Jinpyo
Lee, Jeon-Kook
Im, Hyunsik
Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title_full Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title_fullStr Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title_full_unstemmed Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title_short Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
title_sort resistance switching mode transformation in srruo(3)/cr-doped srzro(3)/pt frameworks via a thermally activated ti out-diffusion process
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4258682/
https://www.ncbi.nlm.nih.gov/pubmed/25483325
http://dx.doi.org/10.1038/srep07354
work_keys_str_mv AT joyongcheol resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT jungkyooho resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT kimjongmin resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT woohyeonseok resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT hanjaeseok resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT kimhyungsang resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT hongjinpyo resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT leejeonkook resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess
AT imhyunsik resistanceswitchingmodetransformationinsrruo3crdopedsrzro3ptframeworksviaathermallyactivatedtioutdiffusionprocess