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Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process
This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characte...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4258682/ https://www.ncbi.nlm.nih.gov/pubmed/25483325 http://dx.doi.org/10.1038/srep07354 |
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author | Jo, Yongcheol Jung, Kyooho Kim, Jongmin Woo, Hyeonseok Han, Jaeseok Kim, Hyungsang Hong, Jinpyo Lee, Jeon-Kook Im, Hyunsik |
author_facet | Jo, Yongcheol Jung, Kyooho Kim, Jongmin Woo, Hyeonseok Han, Jaeseok Kim, Hyungsang Hong, Jinpyo Lee, Jeon-Kook Im, Hyunsik |
author_sort | Jo, Yongcheol |
collection | PubMed |
description | This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characteristics are observed within the RS voltage window of −2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiO(x) where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels. |
format | Online Article Text |
id | pubmed-4258682 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-42586822014-12-15 Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process Jo, Yongcheol Jung, Kyooho Kim, Jongmin Woo, Hyeonseok Han, Jaeseok Kim, Hyungsang Hong, Jinpyo Lee, Jeon-Kook Im, Hyunsik Sci Rep Article This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO(3) (SRO)/Cr-doped SrZrO(3) (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO(2)/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I–V) characteristics are observed within the RS voltage window of −2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiO(x) where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels. Nature Publishing Group 2014-12-08 /pmc/articles/PMC4258682/ /pubmed/25483325 http://dx.doi.org/10.1038/srep07354 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/ |
spellingShingle | Article Jo, Yongcheol Jung, Kyooho Kim, Jongmin Woo, Hyeonseok Han, Jaeseok Kim, Hyungsang Hong, Jinpyo Lee, Jeon-Kook Im, Hyunsik Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title | Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title_full | Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title_fullStr | Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title_full_unstemmed | Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title_short | Resistance switching mode transformation in SrRuO(3)/Cr-doped SrZrO(3)/Pt frameworks via a thermally activated Ti out-diffusion process |
title_sort | resistance switching mode transformation in srruo(3)/cr-doped srzro(3)/pt frameworks via a thermally activated ti out-diffusion process |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4258682/ https://www.ncbi.nlm.nih.gov/pubmed/25483325 http://dx.doi.org/10.1038/srep07354 |
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