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Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells

The phosphorus barrier layers at the doping procedure of silicon wafers were fabricated using a spin-coating method with a mixture of silica-sol and tetramethylammonium hydroxide, which can be formed at the rear surface prior to the front phosphorus spin-on-demand (SOD) diffusion and directly anneal...

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Autores principales: Uzum, Abdullah, Fukatsu, Ken, Kanda, Hiroyuki, Kimura, Yutaka, Tanimoto, Kenji, Yoshinaga, Seiya, Jiang, Yunjian, Ishikawa, Yasuaki, Uraoka, Yukiharu, Ito, Seigo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4266528/
https://www.ncbi.nlm.nih.gov/pubmed/25520602
http://dx.doi.org/10.1186/1556-276X-9-659
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author Uzum, Abdullah
Fukatsu, Ken
Kanda, Hiroyuki
Kimura, Yutaka
Tanimoto, Kenji
Yoshinaga, Seiya
Jiang, Yunjian
Ishikawa, Yasuaki
Uraoka, Yukiharu
Ito, Seigo
author_facet Uzum, Abdullah
Fukatsu, Ken
Kanda, Hiroyuki
Kimura, Yutaka
Tanimoto, Kenji
Yoshinaga, Seiya
Jiang, Yunjian
Ishikawa, Yasuaki
Uraoka, Yukiharu
Ito, Seigo
author_sort Uzum, Abdullah
collection PubMed
description The phosphorus barrier layers at the doping procedure of silicon wafers were fabricated using a spin-coating method with a mixture of silica-sol and tetramethylammonium hydroxide, which can be formed at the rear surface prior to the front phosphorus spin-on-demand (SOD) diffusion and directly annealed simultaneously with the front phosphorus layer. The optimization of coating thickness was obtained by changing the applied spin-coating speed; from 2,000 to 8,000 rpm. The CZ-Si p-type silicon solar cells were fabricated with/without using the rear silica-sol layer after taking the sheet resistance measurements, SIMS analysis, and SEM measurements of the silica-sol material evaluations into consideration. For the fabrication of solar cells, a spin-coating phosphorus source was used to form the n(+) emitter and was then diffused at 930°C for 35 min. The out-gas diffusion of phosphorus could be completely prevented by spin-coated silica-sol film placed on the rear side of the wafers coated prior to the diffusion process. A roughly 2% improvement in the conversion efficiency was observed when silica-sol was utilized during the phosphorus diffusion step. These results can suggest that the silica-sol material can be an attractive candidate for low-cost and easily applicable spin-coating barrier for any masking purpose involving phosphorus diffusion.
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spelling pubmed-42665282014-12-17 Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells Uzum, Abdullah Fukatsu, Ken Kanda, Hiroyuki Kimura, Yutaka Tanimoto, Kenji Yoshinaga, Seiya Jiang, Yunjian Ishikawa, Yasuaki Uraoka, Yukiharu Ito, Seigo Nanoscale Res Lett Nano Express The phosphorus barrier layers at the doping procedure of silicon wafers were fabricated using a spin-coating method with a mixture of silica-sol and tetramethylammonium hydroxide, which can be formed at the rear surface prior to the front phosphorus spin-on-demand (SOD) diffusion and directly annealed simultaneously with the front phosphorus layer. The optimization of coating thickness was obtained by changing the applied spin-coating speed; from 2,000 to 8,000 rpm. The CZ-Si p-type silicon solar cells were fabricated with/without using the rear silica-sol layer after taking the sheet resistance measurements, SIMS analysis, and SEM measurements of the silica-sol material evaluations into consideration. For the fabrication of solar cells, a spin-coating phosphorus source was used to form the n(+) emitter and was then diffused at 930°C for 35 min. The out-gas diffusion of phosphorus could be completely prevented by spin-coated silica-sol film placed on the rear side of the wafers coated prior to the diffusion process. A roughly 2% improvement in the conversion efficiency was observed when silica-sol was utilized during the phosphorus diffusion step. These results can suggest that the silica-sol material can be an attractive candidate for low-cost and easily applicable spin-coating barrier for any masking purpose involving phosphorus diffusion. Springer 2014-12-05 /pmc/articles/PMC4266528/ /pubmed/25520602 http://dx.doi.org/10.1186/1556-276X-9-659 Text en Copyright © 2014 Uzum et al.; licensee Springer. http://creativecommons.org/licenses/by/4.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.
spellingShingle Nano Express
Uzum, Abdullah
Fukatsu, Ken
Kanda, Hiroyuki
Kimura, Yutaka
Tanimoto, Kenji
Yoshinaga, Seiya
Jiang, Yunjian
Ishikawa, Yasuaki
Uraoka, Yukiharu
Ito, Seigo
Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title_full Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title_fullStr Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title_full_unstemmed Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title_short Silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
title_sort silica-sol-based spin-coating barrier layer against phosphorous diffusion for crystalline silicon solar cells
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4266528/
https://www.ncbi.nlm.nih.gov/pubmed/25520602
http://dx.doi.org/10.1186/1556-276X-9-659
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