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Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions

In this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surfac...

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Autores principales: Khung, Yit Lung, Ngalim, Siti Hawa, Scaccabarozzi, Andrea, Narducci, Dario
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4311582/
https://www.ncbi.nlm.nih.gov/pubmed/25671148
http://dx.doi.org/10.3762/bjnano.6.3
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author Khung, Yit Lung
Ngalim, Siti Hawa
Scaccabarozzi, Andrea
Narducci, Dario
author_facet Khung, Yit Lung
Ngalim, Siti Hawa
Scaccabarozzi, Andrea
Narducci, Dario
author_sort Khung, Yit Lung
collection PubMed
description In this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surface coupling is biased towards the formation of Si–O–C linkages instead of Si–C linkages, thus indirectly supporting the kinetic model of hydrogen abstraction from the Si–H surface (Khung, Y. L. et al. Chem. – Eur. J. 2014, 20, 15151–15158). To further examine the probability of this kinetic model we compare the results from reactions with bifunctional alkynes carried out under thermal treatment (<130 °C) and under UV irradiation, respectively. X-ray photoelectron spectroscopy and contact angle measurements showed that under thermal conditions, the Si–H surface predominately reacts to form Si–O–C bonds from ethynylbenzyl alcohol solution while the UV photochemical route ensures that the alcohol-based alkyne may also form Si–C bonds, thus producing a monolayer of mixed linkages. The results suggested the importance of surface radicals as well as the type of terminal group as being essential towards directing the nature of surface linkage.
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spelling pubmed-43115822015-02-10 Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions Khung, Yit Lung Ngalim, Siti Hawa Scaccabarozzi, Andrea Narducci, Dario Beilstein J Nanotechnol Letter In this letter, we report results of a hydrosilylation carried out on bifunctional molecules by using two different approaches, namely through thermal treatment and photochemical treatment through UV irradiation. Previously, our group also demonstrated that in a mixed alkyne/alcohol solution, surface coupling is biased towards the formation of Si–O–C linkages instead of Si–C linkages, thus indirectly supporting the kinetic model of hydrogen abstraction from the Si–H surface (Khung, Y. L. et al. Chem. – Eur. J. 2014, 20, 15151–15158). To further examine the probability of this kinetic model we compare the results from reactions with bifunctional alkynes carried out under thermal treatment (<130 °C) and under UV irradiation, respectively. X-ray photoelectron spectroscopy and contact angle measurements showed that under thermal conditions, the Si–H surface predominately reacts to form Si–O–C bonds from ethynylbenzyl alcohol solution while the UV photochemical route ensures that the alcohol-based alkyne may also form Si–C bonds, thus producing a monolayer of mixed linkages. The results suggested the importance of surface radicals as well as the type of terminal group as being essential towards directing the nature of surface linkage. Beilstein-Institut 2015-01-05 /pmc/articles/PMC4311582/ /pubmed/25671148 http://dx.doi.org/10.3762/bjnano.6.3 Text en Copyright © 2015, Khung et al. https://creativecommons.org/licenses/by/2.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Letter
Khung, Yit Lung
Ngalim, Siti Hawa
Scaccabarozzi, Andrea
Narducci, Dario
Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_full Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_fullStr Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_full_unstemmed Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_short Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
title_sort formation of stable si–o–c submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions
topic Letter
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4311582/
https://www.ncbi.nlm.nih.gov/pubmed/25671148
http://dx.doi.org/10.3762/bjnano.6.3
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