Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials

Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller tha...

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Detalles Bibliográficos
Autores principales: Wang, Xiao-Dong, Chen, Bo, Wang, Hai-Feng, He, Fei, Zheng, Xin, He, Ling-Ping, Chen, Bin, Liu, Shi-Jie, Cui, Zhong-Xu, Yang, Xiao-Hu, Li, Yun-Peng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4330531/
https://www.ncbi.nlm.nih.gov/pubmed/25687255
http://dx.doi.org/10.1038/srep08503
Descripción
Sumario:Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF(2) multilayer was successfully designed and fabricated and it shows high reflectance in 140–180 nm, suppressed reflectance in 120–137 nm and 181–220 nm.

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