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Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials
Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller tha...
| Autores principales: | , , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4330531/ https://www.ncbi.nlm.nih.gov/pubmed/25687255 http://dx.doi.org/10.1038/srep08503 |
| _version_ | 1782357593720619008 |
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| author | Wang, Xiao-Dong Chen, Bo Wang, Hai-Feng He, Fei Zheng, Xin He, Ling-Ping Chen, Bin Liu, Shi-Jie Cui, Zhong-Xu Yang, Xiao-Hu Li, Yun-Peng |
| author_facet | Wang, Xiao-Dong Chen, Bo Wang, Hai-Feng He, Fei Zheng, Xin He, Ling-Ping Chen, Bin Liu, Shi-Jie Cui, Zhong-Xu Yang, Xiao-Hu Li, Yun-Peng |
| author_sort | Wang, Xiao-Dong |
| collection | PubMed |
| description | Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF(2) multilayer was successfully designed and fabricated and it shows high reflectance in 140–180 nm, suppressed reflectance in 120–137 nm and 181–220 nm. |
| format | Online Article Text |
| id | pubmed-4330531 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2015 |
| publisher | Nature Publishing Group |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-43305312015-02-23 Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials Wang, Xiao-Dong Chen, Bo Wang, Hai-Feng He, Fei Zheng, Xin He, Ling-Ping Chen, Bin Liu, Shi-Jie Cui, Zhong-Xu Yang, Xiao-Hu Li, Yun-Peng Sci Rep Article Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF(2) multilayer was successfully designed and fabricated and it shows high reflectance in 140–180 nm, suppressed reflectance in 120–137 nm and 181–220 nm. Nature Publishing Group 2015-02-17 /pmc/articles/PMC4330531/ /pubmed/25687255 http://dx.doi.org/10.1038/srep08503 Text en Copyright © 2015, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
| spellingShingle | Article Wang, Xiao-Dong Chen, Bo Wang, Hai-Feng He, Fei Zheng, Xin He, Ling-Ping Chen, Bin Liu, Shi-Jie Cui, Zhong-Xu Yang, Xiao-Hu Li, Yun-Peng Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title | Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title_full | Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title_fullStr | Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title_full_unstemmed | Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title_short | Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| title_sort | design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials |
| topic | Article |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4330531/ https://www.ncbi.nlm.nih.gov/pubmed/25687255 http://dx.doi.org/10.1038/srep08503 |
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