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Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials

Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller tha...

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Detalles Bibliográficos
Autores principales:	Wang, Xiao-Dong, Chen, Bo, Wang, Hai-Feng, He, Fei, Zheng, Xin, He, Ling-Ping, Chen, Bin, Liu, Shi-Jie, Cui, Zhong-Xu, Yang, Xiao-Hu, Li, Yun-Peng
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2015
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4330531/ https://www.ncbi.nlm.nih.gov/pubmed/25687255 http://dx.doi.org/10.1038/srep08503

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