Maskless milling of diamond by a focused oxygen ion beam

Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless mil...

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Autores principales: Martin, Aiden A., Randolph, Steven, Botman, Aurelien, Toth, Milos, Aharonovich, Igor
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4354013/
https://www.ncbi.nlm.nih.gov/pubmed/25753406
http://dx.doi.org/10.1038/srep08958
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author Martin, Aiden A.
Randolph, Steven
Botman, Aurelien
Toth, Milos
Aharonovich, Igor
author_facet Martin, Aiden A.
Randolph, Steven
Botman, Aurelien
Toth, Milos
Aharonovich, Igor
author_sort Martin, Aiden A.
collection PubMed
description Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.
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spelling pubmed-43540132015-03-17 Maskless milling of diamond by a focused oxygen ion beam Martin, Aiden A. Randolph, Steven Botman, Aurelien Toth, Milos Aharonovich, Igor Sci Rep Article Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching. Nature Publishing Group 2015-03-10 /pmc/articles/PMC4354013/ /pubmed/25753406 http://dx.doi.org/10.1038/srep08958 Text en Copyright © 2015, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Martin, Aiden A.
Randolph, Steven
Botman, Aurelien
Toth, Milos
Aharonovich, Igor
Maskless milling of diamond by a focused oxygen ion beam
title Maskless milling of diamond by a focused oxygen ion beam
title_full Maskless milling of diamond by a focused oxygen ion beam
title_fullStr Maskless milling of diamond by a focused oxygen ion beam
title_full_unstemmed Maskless milling of diamond by a focused oxygen ion beam
title_short Maskless milling of diamond by a focused oxygen ion beam
title_sort maskless milling of diamond by a focused oxygen ion beam
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4354013/
https://www.ncbi.nlm.nih.gov/pubmed/25753406
http://dx.doi.org/10.1038/srep08958
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