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Surface properties and biocompatibility of nanostructured TiO(2) film deposited by RF magnetron sputtering
Nanostructured TiO(2) films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of −50 V. X-ray diffraction (XRD) analysis reveals that TiO(2) films deposited on unbiased...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer US
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385009/ https://www.ncbi.nlm.nih.gov/pubmed/25852353 http://dx.doi.org/10.1186/s11671-015-0732-7 |