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Surface properties and biocompatibility of nanostructured TiO(2) film deposited by RF magnetron sputtering

Nanostructured TiO(2) films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of −50 V. X-ray diffraction (XRD) analysis reveals that TiO(2) films deposited on unbiased...

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Detalles Bibliográficos
Autores principales:	Majeed, Asif, He, Jie, Jiao, Lingrui, Zhong, Xiaoxia, Sheng, Zhengming
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Springer US 2015
Materias:	Nano Express
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385009/ https://www.ncbi.nlm.nih.gov/pubmed/25852353 http://dx.doi.org/10.1186/s11671-015-0732-7

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