Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC ar...

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Autores principales: Kim, Eunah, Cho, Yunae, Park, Kwang-Tae, Choi, Jun-Hyuk, Lim, Seung-Hyuk, Cho, Yong-Hoon, Nam, Yoon-Ho, Lee, Jung-Ho, Kim, Dong-Wook
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4395620/
https://www.ncbi.nlm.nih.gov/pubmed/25897308
http://dx.doi.org/10.1186/s11671-015-0865-8
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author Kim, Eunah
Cho, Yunae
Park, Kwang-Tae
Choi, Jun-Hyuk
Lim, Seung-Hyuk
Cho, Yong-Hoon
Nam, Yoon-Ho
Lee, Jung-Ho
Kim, Dong-Wook
author_facet Kim, Eunah
Cho, Yunae
Park, Kwang-Tae
Choi, Jun-Hyuk
Lim, Seung-Hyuk
Cho, Yong-Hoon
Nam, Yoon-Ho
Lee, Jung-Ho
Kim, Dong-Wook
author_sort Kim, Eunah
collection PubMed
description We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf
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spelling pubmed-43956202015-04-20 Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique Kim, Eunah Cho, Yunae Park, Kwang-Tae Choi, Jun-Hyuk Lim, Seung-Hyuk Cho, Yong-Hoon Nam, Yoon-Ho Lee, Jung-Ho Kim, Dong-Wook Nanoscale Res Lett Nano Express We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf Springer US 2015-04-03 /pmc/articles/PMC4395620/ /pubmed/25897308 http://dx.doi.org/10.1186/s11671-015-0865-8 Text en © Kim et al.; licensee Springer. 2015 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.
spellingShingle Nano Express
Kim, Eunah
Cho, Yunae
Park, Kwang-Tae
Choi, Jun-Hyuk
Lim, Seung-Hyuk
Cho, Yong-Hoon
Nam, Yoon-Ho
Lee, Jung-Ho
Kim, Dong-Wook
Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title_full Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title_fullStr Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title_full_unstemmed Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title_short Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
title_sort mie resonance-mediated antireflection effects of si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4395620/
https://www.ncbi.nlm.nih.gov/pubmed/25897308
http://dx.doi.org/10.1186/s11671-015-0865-8
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