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A bifractal nature of reticular patterns induced by oxygen plasma on polymer films
Plasma etching was demonstrated to be a promising tool for generating self-organized nano-patterns on various commercial films. Unfortunately, dynamic scaling approach toward fundamental understanding of the formation and growth of the plasma-induced nano-structure has not always been straightforwar...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2015
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4440523/ https://www.ncbi.nlm.nih.gov/pubmed/25997075 http://dx.doi.org/10.1038/srep10126 |
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author | Bae, Junwan Lee, I. J. |
author_facet | Bae, Junwan Lee, I. J. |
author_sort | Bae, Junwan |
collection | PubMed |
description | Plasma etching was demonstrated to be a promising tool for generating self-organized nano-patterns on various commercial films. Unfortunately, dynamic scaling approach toward fundamental understanding of the formation and growth of the plasma-induced nano-structure has not always been straightforward. The temporal evolution of self-aligned nano-patterns may often evolve with an additional scale-invariance, which leads to breakdown of the well-established dynamic scaling law. The concept of a bifractal interface is successfully applied to reticular patterns induced by oxygen plasma on the surface of polymer films. The reticular pattern, composed of nano-size self-aligned protuberances and underlying structure, develops two types of anomalous dynamic scaling characterized by super-roughening and intrinsic anomalous scaling, respectively. The diffusion and aggregation of short-cleaved chains under the plasma environment are responsible for the regular distribution of the nano-size protuberances. Remarkably, it is uncovered that the dynamic roughening of the underlying structure is governed by a relaxation mechanism described by the Edwards-Wilkinson universality class with a conservative noise. The evidence for the basic phase, characterized by the negative roughness and growth exponents, has been elusive since its first theoretical consideration more than two decades ago. |
format | Online Article Text |
id | pubmed-4440523 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2015 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-44405232015-05-29 A bifractal nature of reticular patterns induced by oxygen plasma on polymer films Bae, Junwan Lee, I. J. Sci Rep Article Plasma etching was demonstrated to be a promising tool for generating self-organized nano-patterns on various commercial films. Unfortunately, dynamic scaling approach toward fundamental understanding of the formation and growth of the plasma-induced nano-structure has not always been straightforward. The temporal evolution of self-aligned nano-patterns may often evolve with an additional scale-invariance, which leads to breakdown of the well-established dynamic scaling law. The concept of a bifractal interface is successfully applied to reticular patterns induced by oxygen plasma on the surface of polymer films. The reticular pattern, composed of nano-size self-aligned protuberances and underlying structure, develops two types of anomalous dynamic scaling characterized by super-roughening and intrinsic anomalous scaling, respectively. The diffusion and aggregation of short-cleaved chains under the plasma environment are responsible for the regular distribution of the nano-size protuberances. Remarkably, it is uncovered that the dynamic roughening of the underlying structure is governed by a relaxation mechanism described by the Edwards-Wilkinson universality class with a conservative noise. The evidence for the basic phase, characterized by the negative roughness and growth exponents, has been elusive since its first theoretical consideration more than two decades ago. Nature Publishing Group 2015-05-20 /pmc/articles/PMC4440523/ /pubmed/25997075 http://dx.doi.org/10.1038/srep10126 Text en Copyright © 2015, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Bae, Junwan Lee, I. J. A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title | A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title_full | A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title_fullStr | A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title_full_unstemmed | A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title_short | A bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
title_sort | bifractal nature of reticular patterns induced by oxygen plasma on polymer films |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4440523/ https://www.ncbi.nlm.nih.gov/pubmed/25997075 http://dx.doi.org/10.1038/srep10126 |
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