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Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces

Continuous monitoring for possible exposure to carbon nanotubes was conducted over a period of 2 to 3 days at workplaces that manufacture multiwall carbon nanotubes (MWCNTs) and single wall carbon nanotubes (SWCNTs). To estimate the potential emission of carbon nanotubes (CNTs) and potential exposur...

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Autores principales: Lee, Ji Hyun, Ahn, Kang Ho, Kim, Sun Man, Kim, Ellen, Lee, Gun Ho, Han, Jeong Hee, Yu, Il Je
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Hindawi Publishing Corporation 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4466344/
https://www.ncbi.nlm.nih.gov/pubmed/26125022
http://dx.doi.org/10.1155/2015/237140
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author Lee, Ji Hyun
Ahn, Kang Ho
Kim, Sun Man
Kim, Ellen
Lee, Gun Ho
Han, Jeong Hee
Yu, Il Je
author_facet Lee, Ji Hyun
Ahn, Kang Ho
Kim, Sun Man
Kim, Ellen
Lee, Gun Ho
Han, Jeong Hee
Yu, Il Je
author_sort Lee, Ji Hyun
collection PubMed
description Continuous monitoring for possible exposure to carbon nanotubes was conducted over a period of 2 to 3 days at workplaces that manufacture multiwall carbon nanotubes (MWCNTs) and single wall carbon nanotubes (SWCNTs). To estimate the potential emission of carbon nanotubes (CNTs) and potential exposure of workers, personal sampling, area monitoring, and real-time monitoring using an scanning mobility particle sizer (SMPS) and dust monitor were conducted at workplaces where the workers manufactured CNTs. The personal and area sampling of the total suspended particulate (TSP) at the MWCNT manufacturing facilities ranged from 0.031 to 0.254 and from N.D (not detected) to 0.253 mg/m(3), respectively. This 2- to 3-day monitoring study found that nanoparticles were released when opening the chemical vapor deposit (CVD) reactor door after the synthesis of MWCNTs, when transferring the MWCNTs to containers and during blending and grinding. However, distinguishing the background concentration from the work process particle emission was complicated due to sustained and even increased particle concentrations after the work processes were terminated. The MWCNTs sampled for transmission electron microscopy (TEM) observation exhibited a tangled shape with no individual dispersed CNT structures.
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spelling pubmed-44663442015-06-29 Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces Lee, Ji Hyun Ahn, Kang Ho Kim, Sun Man Kim, Ellen Lee, Gun Ho Han, Jeong Hee Yu, Il Je Biomed Res Int Research Article Continuous monitoring for possible exposure to carbon nanotubes was conducted over a period of 2 to 3 days at workplaces that manufacture multiwall carbon nanotubes (MWCNTs) and single wall carbon nanotubes (SWCNTs). To estimate the potential emission of carbon nanotubes (CNTs) and potential exposure of workers, personal sampling, area monitoring, and real-time monitoring using an scanning mobility particle sizer (SMPS) and dust monitor were conducted at workplaces where the workers manufactured CNTs. The personal and area sampling of the total suspended particulate (TSP) at the MWCNT manufacturing facilities ranged from 0.031 to 0.254 and from N.D (not detected) to 0.253 mg/m(3), respectively. This 2- to 3-day monitoring study found that nanoparticles were released when opening the chemical vapor deposit (CVD) reactor door after the synthesis of MWCNTs, when transferring the MWCNTs to containers and during blending and grinding. However, distinguishing the background concentration from the work process particle emission was complicated due to sustained and even increased particle concentrations after the work processes were terminated. The MWCNTs sampled for transmission electron microscopy (TEM) observation exhibited a tangled shape with no individual dispersed CNT structures. Hindawi Publishing Corporation 2015 2015-06-01 /pmc/articles/PMC4466344/ /pubmed/26125022 http://dx.doi.org/10.1155/2015/237140 Text en Copyright © 2015 Ji Hyun Lee et al. https://creativecommons.org/licenses/by/3.0/ This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Research Article
Lee, Ji Hyun
Ahn, Kang Ho
Kim, Sun Man
Kim, Ellen
Lee, Gun Ho
Han, Jeong Hee
Yu, Il Je
Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title_full Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title_fullStr Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title_full_unstemmed Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title_short Three-Day Continuous Exposure Monitoring of CNT Manufacturing Workplaces
title_sort three-day continuous exposure monitoring of cnt manufacturing workplaces
topic Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4466344/
https://www.ncbi.nlm.nih.gov/pubmed/26125022
http://dx.doi.org/10.1155/2015/237140
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