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Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells

A composite photoanode comprising ultralong ZnO nanobelts and TiO(2) nanoparticles was prepared and its performance in dye-sensitized solar cells (DSSCs) was optimized and compared to the photoanode consisting of conventional TiO(2) nanoparticles. The ultralong ZnO nanobelts were synthesized in high...

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Autores principales: Lu, Hao, Tian, Wei, Guo, Jun, Li, Liang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4523832/
https://www.ncbi.nlm.nih.gov/pubmed/26238737
http://dx.doi.org/10.1038/srep12765
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author Lu, Hao
Tian, Wei
Guo, Jun
Li, Liang
author_facet Lu, Hao
Tian, Wei
Guo, Jun
Li, Liang
author_sort Lu, Hao
collection PubMed
description A composite photoanode comprising ultralong ZnO nanobelts and TiO(2) nanoparticles was prepared and its performance in dye-sensitized solar cells (DSSCs) was optimized and compared to the photoanode consisting of conventional TiO(2) nanoparticles. The ultralong ZnO nanobelts were synthesized in high yield by a facile solution approach at 90 (o)C followed by annealing at 500 (o)C. The effect of the ratio of ZnO nanobelts to TiO(2) nanoparticles on the light scattering, specific surface area, and interface recombination were investigated. An optimum amount of ZnO nanobelts enhanced the photon-conversion efficiency by 61.4% compared to that of the conventional TiO(2) nanoparticles. To further reduce the recombination rate and increase the carrier lifetime, Atomic Layer Deposition (ALD) technique was utilized to coat a continuous TiO(2) film surrounding the ZnO nanobelts and TiO(2) nanoparticles, functioning as a barrier-free access of all electrons to conductive electrodes. This ALD treatment improved the interface contact within the whole photoanode system, finally leading to significant enhancement (137%) in the conversion efficiency of DSSCs.
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spelling pubmed-45238322015-08-05 Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells Lu, Hao Tian, Wei Guo, Jun Li, Liang Sci Rep Article A composite photoanode comprising ultralong ZnO nanobelts and TiO(2) nanoparticles was prepared and its performance in dye-sensitized solar cells (DSSCs) was optimized and compared to the photoanode consisting of conventional TiO(2) nanoparticles. The ultralong ZnO nanobelts were synthesized in high yield by a facile solution approach at 90 (o)C followed by annealing at 500 (o)C. The effect of the ratio of ZnO nanobelts to TiO(2) nanoparticles on the light scattering, specific surface area, and interface recombination were investigated. An optimum amount of ZnO nanobelts enhanced the photon-conversion efficiency by 61.4% compared to that of the conventional TiO(2) nanoparticles. To further reduce the recombination rate and increase the carrier lifetime, Atomic Layer Deposition (ALD) technique was utilized to coat a continuous TiO(2) film surrounding the ZnO nanobelts and TiO(2) nanoparticles, functioning as a barrier-free access of all electrons to conductive electrodes. This ALD treatment improved the interface contact within the whole photoanode system, finally leading to significant enhancement (137%) in the conversion efficiency of DSSCs. Nature Publishing Group 2015-08-04 /pmc/articles/PMC4523832/ /pubmed/26238737 http://dx.doi.org/10.1038/srep12765 Text en Copyright © 2015, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Lu, Hao
Tian, Wei
Guo, Jun
Li, Liang
Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title_full Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title_fullStr Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title_full_unstemmed Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title_short Interface Engineering through Atomic Layer Deposition towards Highly Improved Performance of Dye-Sensitized Solar Cells
title_sort interface engineering through atomic layer deposition towards highly improved performance of dye-sensitized solar cells
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4523832/
https://www.ncbi.nlm.nih.gov/pubmed/26238737
http://dx.doi.org/10.1038/srep12765
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