Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching

Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared w...

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Detalles Bibliográficos
Autores principales: Ye, Xin, Jiang, Xiaodong, Huang, Jin, Geng, Feng, Sun, Laixi, Zu, Xiaotao, Wu, Weidong, Zheng, Wanguo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4542686/
https://www.ncbi.nlm.nih.gov/pubmed/26268896
http://dx.doi.org/10.1038/srep13023

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4542686/
https://www.ncbi.nlm.nih.gov/pubmed/26268896
http://dx.doi.org/10.1038/srep13023

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